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Pulsed magnetically confined discharge for copper vapor lasers

 

作者: Jun Li,   Qing‐Ming Chen,   Wang Zhang,   Ming‐Jie Xie,   Zai‐Guang Li,   J. J. Pan,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1996)
卷期: Volume 67, issue 11  

页码: 4029-4030

 

ISSN:0034-6748

 

年代: 1996

 

DOI:10.1063/1.1147272

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An extended application of the magnetron sputtering discharge is described. The discharge, called a magnetically confined discharge in the experiments, is pumped in a pulse mode to produce and excite copper vapor atoms for laser operation. Copper atom densities adequate for laser action (∼1014cm−3) are obtained in the discharge at temperatures below 400 K. Laser operation is expected in the experimental apparatus with fast‐rise pulse pumping. ©1996 American Institute of Physics.

 

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