Pulsed magnetically confined discharge for copper vapor lasers
作者:
Jun Li,
Qing‐Ming Chen,
Wang Zhang,
Ming‐Jie Xie,
Zai‐Guang Li,
J. J. Pan,
期刊:
Review of Scientific Instruments
(AIP Available online 1996)
卷期:
Volume 67,
issue 11
页码: 4029-4030
ISSN:0034-6748
年代: 1996
DOI:10.1063/1.1147272
出版商: AIP
数据来源: AIP
摘要:
An extended application of the magnetron sputtering discharge is described. The discharge, called a magnetically confined discharge in the experiments, is pumped in a pulse mode to produce and excite copper vapor atoms for laser operation. Copper atom densities adequate for laser action (∼1014cm−3) are obtained in the discharge at temperatures below 400 K. Laser operation is expected in the experimental apparatus with fast‐rise pulse pumping. ©1996 American Institute of Physics.
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