High‐density plasma mode of an inductively coupled radio frequency discharge
作者:
J. Amorim,
H. S. Maciel,
J. P. Sudano,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 2
页码: 362-365
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585576
出版商: American Vacuum Society
关键词: INDUCTIVELY COUPLED PLASMA;PLASMA DIAGNOSTICS;PLASMA DENSITY;DOUBLE LAYERS;DENSE PLASMA;HIGH−FREQUENCY DISCHARGES;SPUTTERING
数据来源: AIP
摘要:
Experimental observations concerning the formation of a high‐density plasma in an inductively coupled radio frequency (11.4 MHz) discharge in argon are described. These observations are complemented by probe measurements that provide a quantitative description of plasma properties over an useful range of vapor pressure, 0.02–0.2 Torr, and rf power, 50–400 W. It is shown that a dense plasma of the order of 1012cm−3can be easily formed, having the configuration of a luminous plasmoid embedded in a low‐density, 1010cm−3, diffuse plasma.
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