Measurements of the thickness dependence of the electrical resistance of two very thin Cr films deposited at substrate temperatures of 385 and 360 °C and pressures of 4×10−7and 10−6Torr are reported. Preliminary measurements of the thickness dependence of the Ne´el temperature (TN) of the film deposited at 360 °C at thicknesses ≥10 nm are also presented. In these two films the resistance in the thickness region 2≤d≤7.5 nm can be very well described byR∝[(d/dc)−1]−twithdcequal to 1.64±0.20 and 1.03±0.20 nm, respectively, andt=1.34±0.11. The Ne´el temperatures show a turning point around 14 nm in agreement with the known thickness dependence of the stress.dTN/dSthas been found to be ∼100 K/kbar whereStis the internal tensile stress in the film.