Silicon contamination of diamond films deposited on silicon substrates in fused silica based reactors
作者:
C. F. M. Borges,
S. Schelz,
L. St.‐Onge,
M. Moisan,
L. Martinu,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 79,
issue 6
页码: 3290-3298
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.361228
出版商: AIP
数据来源: AIP
摘要:
Deposition of thin diamond films on silicon (Si) substrates and in a reactor with fused silica walls can lead to the incorporation of Si impurities. In the present work, impurities in the bulk of the films were analyzed quantitatively using complementary diagnostic techniques (elastic recoil detection, electron microprobe analysis and secondary ion mass spectrometry), while surface analysis was achieved with x‐ray photoelectron spectroscopy. The Si contamination level in the bulk reaches up to 0.16 at. %. We show that the presence of Si impurities correlates with the fluorescence background that accompanies the 1332 cm−1diamond peak in the Raman spectra. Experiments were performed to distinguish between the Si originating from the wall and from the Si substrate. The effect of O2added to the process gases is also investigated. The diamond films were prepared in a recently developed plasma reactor using a novel configuration of surface‐wave‐sustained discharge: the reactor operation is akin to that of the well‐known plasma‐ball systems. ©1996 American Institute of Physics.
点击下载:
PDF
(411KB)
返 回