Effect of carrier diffusion in oxidized vertical-cavity surface-emitting lasers determined from lateral spontaneous emission
作者:
J. H. Shin,
H. E. Shin,
Y. H. Lee,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 20
页码: 2652-2654
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.118986
出版商: AIP
数据来源: AIP
摘要:
The effect of carrier diffusion on threshold current is studied quantitatively for the oxide-aperturbed 780 nm vertical-cavity surface-emitting lasers (VCSEL) from the measured spontaneous emission. The oxide aperture size of 2–10 &mgr;m is prepared and characterized. The diffusion coefficient of4.6 cm2/sand the nonradiative recombination coefficient of6.8×107/sare obtained using the independence of the nonradiative recombination coefficient on the laser aperture size. The contribution of carrier diffusion loss is 42&percent; of the threshold current for the 2 &mgr;m VCSEL. The relative contribution of the diffusion becomes smaller for the larger devices as is expected. ©1997 American Institute of Physics.
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