H2damage of ferroelectricPb(Zr,Ti)O3thin-film capacitors—The role of catalytic and adsorptive activity of the top electrode
作者:
Y. Shimamoto,
K. Kushida-Abdelghafar,
H. Miki,
Y. Fujisaki,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 23
页码: 3096-3097
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119102
出版商: AIP
数据来源: AIP
摘要:
Large-scale integrated fabrication in a H2containing atmosphere, for example, during the passivation process, can cause serious damage inmetal/Pb(Zr,Ti)O3/metal capacitors (i.e., Pt/PZT/Pt capacitors). To reveal the cause of theH2damage, we investigated the behavior of hysteresis curves and the leakage current of capacitors with a top electrode of Pt, Pd, Au, or Ag. Capacitors with a top electrode of Au or Ag are more resistant to theH2annealing damage than those of Pt or Pd. We found that theH2damage was strongly affected by the catalytic activity and adsorptive properties of the top electrode when exposed toH2. ©1997 American Institute of Physics.
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