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Characterization and study of light degradation effects in ECR a‐Si, Cl films

 

作者: C. P. Palsule,   S. Gangopadhyay,   C. Young,   T. Trost,   M. Kristiansen,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1991)
卷期: Volume 234, issue 1  

页码: 226-233

 

ISSN:0094-243X

 

年代: 1991

 

DOI:10.1063/1.41032

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have studied the electrical and optical properties along with light induced degradation of a‐Si:H, Cl films prepared by electron cyclotron resonance (ECR) plasma. We find that there is an irreversible decrease in dark conductivity of these films after vacuum anneal at 200°C. The degradation in photoconductivity of these films due to the Staebler‐Wronski effect is smaller than that observed in glow discharge prepared a‐Si:H films.

 

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