Characterization and study of light degradation effects in ECR a‐Si, Cl films
作者:
C. P. Palsule,
S. Gangopadhyay,
C. Young,
T. Trost,
M. Kristiansen,
期刊:
AIP Conference Proceedings
(AIP Available online 1991)
卷期:
Volume 234,
issue 1
页码: 226-233
ISSN:0094-243X
年代: 1991
DOI:10.1063/1.41032
出版商: AIP
数据来源: AIP
摘要:
We have studied the electrical and optical properties along with light induced degradation of a‐Si:H, Cl films prepared by electron cyclotron resonance (ECR) plasma. We find that there is an irreversible decrease in dark conductivity of these films after vacuum anneal at 200°C. The degradation in photoconductivity of these films due to the Staebler‐Wronski effect is smaller than that observed in glow discharge prepared a‐Si:H films.
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