Comments on: ‘‘Chemical conversion of composite films on silicon by electron beam irradiation’’

 

作者: Robert B. Heimann,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1983）
卷期: Volume 1, issue 1  

页码: 108-110

 

ISSN:0734-211X

 

年代: 1983

 

DOI:10.1116/1.582532

 

出版商: American Vacuum Society

 

关键词: silicon;electron beams;irradiation;auger electron spectroscopy;integrated circuits;fabrication;films;silicon oxides;silicon nitrides;synthesis

 

数据来源: AIP

 

 

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