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Manufacturing of perovskite thin films using liquid delivery MOCVD

 

作者: P.C. Van Buskirk,   J.F. Roeder,   S. Bilodeau,  

 

期刊: Integrated Ferroelectrics  (Taylor Available online 1995)
卷期: Volume 10, issue 1-4  

页码: 9-22

 

ISSN:1058-4587

 

年代: 1995

 

DOI:10.1080/10584589508012259

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

There are numerous ternary and quaternary oxides that are attractive for use in advanced IC's. These include Ba1-xSrxTiO3(BST), Pb1-xLax(Zr1-yTiy)1-x/4O3(PLZT) and SrBi2Ta2O9. Although each application has unique material requirements, in most cases the deposition process must have good conformality, composition control and throughput, while minimizing the thermal budget. For these reasons, metalorganic chemical vapor deposition (MOCVD) is acknowledged as the leading candidate for manufacturing. The absence of volatile (and in some cases stable) precursors has stimulated the use of the ‘‘liquid delivery technique'’ for transport of a system of precursors in liquid solution, which are vaporized simultaneously. Film composition is easily varied by mixing component solutions which contain one or more of the metalorganic compounds. The paper will focus on the role of measurement and control of film composition in the development of a manufacturing process for perovskites and related materials. Select results for BST and PZT thin films deposited using liquid delivery CVD will be discussed.

 

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