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Pressure relaxation in atomic mixing and preferential sputtering

 

作者: R. Collins,   P. Sigmund,  

 

期刊: Journal of Applied Physics  （AIP Available online 1992）
卷期: Volume 72, issue 5  

页码: 1993-1995

 

ISSN:0021-8979

 

年代: 1992

 

DOI:10.1063/1.351626

 

出版商: AIP

 

数据来源: AIP

 

摘要:

It is demonstrated explicitly that the collective‐current concept in atomic mixing, as formulated by Collins, is equivalent with the homogeneous‐relaxation model proposed by Hofer and Littmark. Both schemes lead to the balance equation of Sigmund, Oliva, and Falcone. The relation to Titov’s model of high‐fluence ion implantation is clarified.

 

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