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HgCdTe double heterostructure injection laser grown by molecular beam epitaxy

 

作者: M. Zandian,   J. M. Arias,   R. Zucca,   R. V. Gil,   S. H. Shin,  

 

期刊: Applied Physics Letters  (AIP Available online 1991)
卷期: Volume 59, issue 9  

页码: 1022-1024

 

ISSN:0003-6951

 

年代: 1991

 

DOI:10.1063/1.106332

 

出版商: AIP

 

数据来源: AIP

 

摘要:

While a variety of light‐detecting devices have been made with HgCdTe, little has been done to apply this technology to light‐emitting devices. We report here the successful fabrication and operation of the first HgCdTe injection laser. This stripe‐geometry double‐heterostructure laser was operated under pulsed current at temperatures between 40 and 90 K. At 77 K, the emission wavelength was 2.86 &mgr;m with a linewidth of 0.3 meV, and the pulsed threshold current density was 625 A/cm2. The double heterostructure, with a 1.4‐&mgr;m‐thick active layer, was grown andinsitudoped by molecular beam epitaxy (MBE). Thep+andn+confinement layers were doped with arsenic and indium, respectively.

 

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