A thermally activated solid state reaction process for fabricating ohmic contacts to semiconducting diamond
作者:
K. L. Moazed,
J. R. Zeidler,
M. J. Taylor,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 68,
issue 5
页码: 2246-2254
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.346529
出版商: AIP
数据来源: AIP
摘要:
Techniques have been developed to produce ohmic contacts to naturally occurring boron doped semiconducting diamond. Thin films of Mo, Mo/Au, and Mo/Ni/Au deposited on diamond produced adherent ohmic contacts after annealing at 950 °C. A thermally activated solid state reaction which produces a refractory carbide precipitate at the original diamond/metal interface is the principal factor in affecting the properties of the contacts. The interface reaction has been characterized using Auger electron spectroscopy, scanning electron microscopy, x‐ray diffraction, metallography, andI‐Vmeasurements.
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