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A thermally activated solid state reaction process for fabricating ohmic contacts to semiconducting diamond

 

作者: K. L. Moazed,   J. R. Zeidler,   M. J. Taylor,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 68, issue 5  

页码: 2246-2254

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.346529

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Techniques have been developed to produce ohmic contacts to naturally occurring boron doped semiconducting diamond. Thin films of Mo, Mo/Au, and Mo/Ni/Au deposited on diamond produced adherent ohmic contacts after annealing at 950 °C. A thermally activated solid state reaction which produces a refractory carbide precipitate at the original diamond/metal interface is the principal factor in affecting the properties of the contacts. The interface reaction has been characterized using Auger electron spectroscopy, scanning electron microscopy, x‐ray diffraction, metallography, andI‐Vmeasurements.

 

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