Structure of Sputtered Molybdenum Disulfide Films at Various Substrate Temperatures
作者:
Talivaldis Spalvins,
期刊:
A S L E Transactions
(Taylor Available online 1974)
卷期:
Volume 17,
issue 1
页码: 1-7
ISSN:0569-8197
年代: 1974
DOI:10.1080/05698197408981432
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
MoS2films (300 to 400 Å) were radio-frequency sputtered on aluminum and nickel surfaces at elevated, ambient, cold water, and liquid nitrogen temperatures. Electron transmission micrographs and electron diffraction patterns were taken to determine the structural growth. These transmission micrographs revealed that sputtered MoS2films at ambient and elevated temperatures (320 and 150 C) formed an irregular network of ridges. The electron diffraction patterns of these films showed relatively sharp diffraction rings, indicating crystallinity. At water temperatures (∼7 C), ridge formation was extensively reduced or completely eliminated. The transmission micrographs of sputtered films at liquid nitrogen temperatures revealed a continuous featureless film. The electron diffraction patterns showed broad, diffused rings indicating an amorphous film. The transmission micrographs of a post annealed (425 C) MoS2film sputtered at liquid nitrogen temperature revealed the tendency for ridge formation. Electron diffraction patterns also showed increased sharpness of the diffraction rings.Presented at the 28th ASLE Annual Meeting in Chicago, Illinois, April 30–May 3, 1973
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