首页   按字顺浏览 期刊浏览 卷期浏览 Optical and structural characteristics of Al2O3films deposited by the reactive ionized ...
Optical and structural characteristics of Al2O3films deposited by the reactive ionized cluster beam method

 

作者: H. Hashimoto,   L. L. Levenson,   H. Usui,   I. Yamada,   T. Takagi,  

 

期刊: Journal of Applied Physics  （AIP Available online 1988）
卷期: Volume 63, issue 1  

页码: 241-244

 

ISSN:0021-8979

 

年代: 1988

 

DOI:10.1063/1.340506

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Al2O3films about 1000 A˚ thick were deposited on polished Si(100) substrates by the reactive ionized cluster beam method. It was found that the index of refraction, the etch rate in HF, and the microstructure of the films could be controlled by varying substrate temperatures up to 600 °C and acceleration voltages between 0.25 and 3 kV.

 

点击下载:  PDF (511KB)



返 回