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Thermoelectric power of thin copper films

 

作者: William F. Leonard,   Ho‐Yuan Yu,  

 

期刊: Journal of Applied Physics  (AIP Available online 1973)
卷期: Volume 44, issue 12  

页码: 5320-5323

 

ISSN:0021-8979

 

年代: 1973

 

DOI:10.1063/1.1662150

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The thermoelectric power and resistivity of annealed copper films have been measured. From the thermoelectric power values at the minimum in resistivity and the corresponding temperature coefficient of resistance, the calculated values of the energy dependence of the mean free path of conduction electrons and the Fermi surface area are −0.21 and −1.43, respectively.

 

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