GaAs structures with electron mobility of 5×106cm2/V s
作者:
J. H. English,
A. C. Gossard,
H. L. Sto¨rmer,
K. W. Baldwin,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 25
页码: 1826-1828
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.97710
出版商: AIP
数据来源: AIP
摘要:
Modulation‐doped GaAs heterostructures with low‐temperature electron mobilities of 5.0×106cm2/V s at a two‐dimensional electron areal density of 1.6×1011cm−2have been made. The mobilities are the highest ever observed in a semiconductor. Multiple quantum wells of GaAs prepared by similar methods showed electron mobilities up to 0.54×106cm2/V s at an areal density of 5.3×1011cm−2per layer, which also exceeds any mobility value previously reported for multiple well structures. The structures were grown by molecular beam epitaxy with an atomic‐plane sheet‐doping technique.
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