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Optical studies of germanium implanted with high dose oxygen

 

作者: Qi‐Chu Zhang,   J. C. Kelly,   D. R. Mills,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 68, issue 9  

页码: 4788-4794

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.346135

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A model has been developed to explain the greatly reduced reflectivities of Ge samples implanted to doses 1.25–1.5×1018O/cm2with 45‐keV O+ions, which have reflectivity values close to zero at 0.7 &mgr;m. The model divides the inhomogeneous implanted layer into a series of homogeneous sublayers with different volume fraction and thickness for each sublayer. The complex refractive indexes for every sublayer are calculated using the Maxwell Garnett (MG) and Persson–Liebsch (PL) theories. Using the expressions for the reflectivity of an absorbing multilayer layer systems, the reflectivities have been calculated. The reflectivity curve calculated in the PL approximation is closer to the experimental observations than is the MG approximation over the wavelength range 0.2–3.0 &mgr;m.

 

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