Electron Beam Evaporator forIn SituElectron Microscope Studies
作者:
K. H. Olsen,
T. E. Hutchinson,
期刊:
Review of Scientific Instruments
(AIP Available online 1965)
卷期:
Volume 36,
issue 12
页码: 1753-1755
ISSN:0034-6748
年代: 1965
DOI:10.1063/1.1719457
出版商: AIP
数据来源: AIP
摘要:
A device for evaporating metals by electron beam bombardment within the electron microscope has been developed which operates without loss of image resolution or stability. This device is particularly applicable to dynamic studies of nucleation and growth of metallic films characterized by unusually high purity and/or high melting points. A hanging drop of molten material, formed by bombardment of the end of a vertical wire by a focused beam of 2–5 kV electrons, provides a controllable source of pure metal vapor.
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