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Aluminum diffusion in ion‐implanted noble metals

 

作者: J. Hirvonen,  

 

期刊: Journal of Applied Physics  (AIP Available online 1981)
卷期: Volume 52, issue 10  

页码: 6143-6146

 

ISSN:0021-8979

 

年代: 1981

 

DOI:10.1063/1.328512

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The diffusion of aluminum in ion‐implanted noble metal‐aluminum solid solutions has been measured using the ( p,&ggr;)‐resonance broadening technique. The investigated temperature ranges were 375–550, 275–425, and 158–350 °C for copper, silver, and gold and the activation energies obtained were 1.88, 1.28, and 0.72 eV, respectively. Only the activation energy of aluminum in copper corresponds in magnitude to the ’’normal impurity diffusion’’ generally found to be valid for solutes in the noble metals.

 

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