首页   按字顺浏览 期刊浏览 卷期浏览 Precursor design for liquid Injection CVD of lead scandium tantalate thin films
Precursor design for liquid Injection CVD of lead scandium tantalate thin films

 

作者: AnthonyC. Jones,   HywelO. Davies,   TimothyJ. Leedham,   PeterJ. Wright,   PenelopeA. Lane,   MichaelJ. Crosbie,   DennisJ. Williams,   JasonC. Jones,   ChristopherL. Reeves,  

 

期刊: Integrated Ferroelectrics  （Taylor Available online 2000）
卷期: Volume 30, issue 1-4  

页码: 19-26

 

ISSN:1058-4587

 

年代: 2000

 

DOI:10.1080/10584580008222249

 

出版商: Taylor & Francis Group

 

关键词: MOCVD;precursors;lead scandium tantalate;pyroelectric oxide

 

数据来源: Taylor

 

摘要:

Liquid Injection Chemical Vapour Deposition is a technique well suited to the deposition of a range of ferroelectric oxides in thin film form. This paper reports on the design and optimisation of the precursors for the deposition of thin films of the promising pyroelectric material, lead scandium tantalate. The design and use of lead, scandium and tantalum precursors with carefully matched chemical and thermal properties allows the growth of thin films with the required perovskite phase above 550°C. These have the desired 111 orientation when grown on to platinum coated silicon substrates at temperatures above 575°C.

 

点击下载:  PDF (296KB)



返 回