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A microscanning electron microscope in ultrahigh vacuum for surface microanalysis

 

作者: M. Fukuoka,   Y. Sakai,   K. Tsunoda,   T. Ichinokawa,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1994)
卷期: Volume 65, issue 9  

页码: 2844-2848

 

ISSN:0034-6748

 

年代: 1994

 

DOI:10.1063/1.1144625

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A microscanning electron microscope (SEM) column has been constructed as an attachment of an ultrahigh‐vacuum chamber with a 70 mm diam flange to observe microstructures on a solid surface. The micro‐SEM column is 26 mm diam and 140 mm long and operated in an energy range from 100 eV to 3 keV. It consists of a thermal‐field‐emission (TFE) gun and two magnetic lenses. The excitation of the objective lens for 3 kV electrons is 250 A T at a working distance of 10 mm. The saturated temperature of the objective lens at the excitation of 250 A T is approximately 50 °C and the vacuum of the chamber is 2×10−10Torr. The electron probe is adjustable against a specimen position from the outside of the vacuum by movement of the SEM column with screws. The spot size of the electron probe is 100 A˚ at 3 kV and 3000 A˚ at 300 eV in conditions of a working distance of 10 mm and a probe current of 3×10−11A.

 

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