A microscanning electron microscope in ultrahigh vacuum for surface microanalysis
作者:
M. Fukuoka,
Y. Sakai,
K. Tsunoda,
T. Ichinokawa,
期刊:
Review of Scientific Instruments
(AIP Available online 1994)
卷期:
Volume 65,
issue 9
页码: 2844-2848
ISSN:0034-6748
年代: 1994
DOI:10.1063/1.1144625
出版商: AIP
数据来源: AIP
摘要:
A microscanning electron microscope (SEM) column has been constructed as an attachment of an ultrahigh‐vacuum chamber with a 70 mm diam flange to observe microstructures on a solid surface. The micro‐SEM column is 26 mm diam and 140 mm long and operated in an energy range from 100 eV to 3 keV. It consists of a thermal‐field‐emission (TFE) gun and two magnetic lenses. The excitation of the objective lens for 3 kV electrons is 250 A T at a working distance of 10 mm. The saturated temperature of the objective lens at the excitation of 250 A T is approximately 50 °C and the vacuum of the chamber is 2×10−10Torr. The electron probe is adjustable against a specimen position from the outside of the vacuum by movement of the SEM column with screws. The spot size of the electron probe is 100 A˚ at 3 kV and 3000 A˚ at 300 eV in conditions of a working distance of 10 mm and a probe current of 3×10−11A.
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