Interfacial strain in AlxGa1−xAs layers on GaAs
作者:
V. S. Speriosu,
M‐A. Nicolet,
J. L. Tandon,
Y. C. M. Yeh,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 57,
issue 4
页码: 1377-1379
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.334490
出版商: AIP
数据来源: AIP
摘要:
Detailed analysis of x‐ray rocking curves was used to determine the depth profile of strain and composition in a 2500‐A˚‐thick layer of AlxGa1−xAs grown by metalorganic chemical vapor deposition on 〈100〉 GaAs. Thexvalue and layer thickness were in good agreement with the values expected from growth parameters. The presence of a transition region, 280 A˚ thick, was detected by the rocking curve. In this region, the Al concentration varies smoothly from 0 to 0.87. Measurement and control of the sharpness of such interfaces has important implications for heterojunction devices.
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