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New portable conformable masking excimer laser lithography using water‐soluble contrast enhanced material

 

作者: M. Endo,   M Sasago,   Y. Hirai,   K. Ogawa,   T. Ishihara,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1988）
卷期: Volume 6, issue 1  

页码: 87-90

 

ISSN:0734-211X

 

年代: 1988

 

DOI:10.1116/1.584058

 

出版商: American Vacuum Society

 

关键词: LITHOGRAPHY;EXCIMER LASERS;PHOTORESISTS;KRYPTON FLUORIDES;KRYPTON FLUORIDE LASERS;RESOLUTION;MASKING;resist

 

数据来源: AIP

 

摘要:

A new portable conformable masking (PCM) using excimer laser lithography has been developed. This method is characterized by the combination of poly(dimethylglutarimide) and the water‐soluble contrast enhanced material developed here and the use of KrF excimer laser exposure. Using this lithography, we obtained good resist pattern profiles and submicron region resolution by a very simple process.

 

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