首页   按字顺浏览 期刊浏览 卷期浏览 Surface morphologies for Br‐etched Si(100)‐2×1: Kinetics of pit growth and step retreat
Surface morphologies for Br‐etched Si(100)‐2×1: Kinetics of pit growth and step retreat

 

作者: F. J. Williams,   C. M. Aldao,   J. H. Weaver,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1996)
卷期: Volume 14, issue 4  

页码: 2519-2523

 

ISSN:1071-1023

 

年代: 1996

 

DOI:10.1116/1.588762

 

出版商: American Vacuum Society

 

关键词: SILICON;ETCHING;BROMINE;TEMPERATURE DEPENDENCE;Si

 

数据来源: AIP

 

摘要:

Temperature‐dependent surface morphologies of Si(100) resulting from Br etching at 700 and 800 K have been studied using scanning tunneling microscopy. Quantitative analysis of linear pit distributions allows us to interpret the mechanisms involved in surface pattern formation. We show that linear chains growing at 800 K on 450‐Å‐wide terraces are in quasi‐steady‐state conditions in that their lengths follow the most probable Flory–Schulz distribution. Results obtained under equivalent conditions at 700 K, however, demonstrate that this distribution is not reached. The difference reflects the rate of step retreat relative to the rate of pit growth. At 700 K, pits that develop on terraces are erased before their length distributions reach quasi‐steady‐state values even though the overall morphology does not change. The surface morphologies that are reached at long times can then be understood by considering the temporal evolution of linear chains on terraces where quasi‐steady‐state conditions are not fulfilled.

 

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