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Ni‐C multilayer reflectivity and photoelectron yield in the NiL‐edge region

 

作者: H. van Brug,   M. P. Bruijn,   R. van der Pol,   M. J. van der Wiel,  

 

期刊: Applied Physics Letters  (AIP Available online 1986)
卷期: Volume 49, issue 15  

页码: 914-916

 

ISSN:0003-6951

 

年代: 1986

 

DOI:10.1063/1.97482

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We analyze measurements of the x‐ray reflectivity and photoelectron yield of a Ni‐C multilayer (103 layers;d=31 A˚) in the NiL‐edge region (700–950 eV). The measured reflectivity is shown to be consistent with the one calculated using x‐ray scattering factors  f1and  f2for Ni as obtained from the photoelectron yield (∼f2). The analysis yields a new set of ‘‘effective’’ values for  f1in the NiL‐edge region.

 

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