Ni‐C multilayer reflectivity and photoelectron yield in the NiL‐edge region
作者:
H. van Brug,
M. P. Bruijn,
R. van der Pol,
M. J. van der Wiel,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 49,
issue 15
页码: 914-916
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.97482
出版商: AIP
数据来源: AIP
摘要:
We analyze measurements of the x‐ray reflectivity and photoelectron yield of a Ni‐C multilayer (103 layers;d=31 A˚) in the NiL‐edge region (700–950 eV). The measured reflectivity is shown to be consistent with the one calculated using x‐ray scattering factors f1and f2for Ni as obtained from the photoelectron yield (∼f2). The analysis yields a new set of ‘‘effective’’ values for f1in the NiL‐edge region.
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