A theoretical model is developed to study the influence of radiation-induced microstructural evolution on the amorphization kinetics of intermetallic compounds. The amorphization mechanism is assumed to be the buildup to a critical level of defect complexes. A complex consists of a coupled interstitial-vacancy pair. It is shown that the process of amorphization under particle bombardment is obstructed in alloy systems in which interstitials exhibit a tendency to cluster. In these systems, interstitial clustering delays the buildup of complexes. Under electron irradiation, the complex concentration attains a very low level after high doses, and the crystalline-to-amorphous transition is inhibited down to fairly low temperatures. During heavy ion bombardment, cascade damage produces an enhancement of complex formation and the transition takes place. It is shown that the kinetics of amorphization under ion bombardment depends on temperature at low temperatures, where amorphization is mostly due to complex accumulation. On the other hand, the present analyses indicate that direct in-cascade amorphization becomes more important as the bombardment temperature increases. Zr3Al is used as a model system. The theoretical calculations yield good agreement with experimental results.