Temperature‐fluctuation noise of thin films supported by a substrate
作者:
K. M. van Vliet,
A. van der Ziel,
R. R. Schmidt,
期刊:
Journal of Applied Physics
(AIP Available online 1980)
卷期:
Volume 51,
issue 6
页码: 2947-2956
ISSN:0021-8979
年代: 1980
DOI:10.1063/1.328104
出版商: AIP
数据来源: AIP
摘要:
A computation is given of the fluctuations in average temperature of an isolated thin film on a substrate, the noise being due to two causes: (i) fluctuations in blackbody radiation absorbed and emitted by the front surface; (ii) thermal diffusion in the sample and the substrate. The surface source results in a large 1/frange, the level of which decreases with increasing heat conductivity of the substrate; the noise goes over into a 1/f2spectrum at high frequencies. The noise due to the volume source results in a 1/f1/2spectrum, going over into a 1/f3/2spectrum at higher frequencies; the noise also decreases with increasing heat conductivity of the substrate. The integrated total noise is of the orderkT20/C. Under most circumstances the spectrum due to the volume source dominates.
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