首页   按字顺浏览 期刊浏览 卷期浏览 Thermal stability of the negative electron affinity condition on cubic boron nitride
Thermal stability of the negative electron affinity condition on cubic boron nitride

 

作者: Kian Ping Loh,   Mikka Nishitani-Gamo,   Isao Sakaguchi,   Takashi Taniguchi,   Toshihiro Ando,  

 

期刊: Applied Physics Letters  (AIP Available online 1998)
卷期: Volume 72, issue 23  

页码: 3023-3025

 

ISSN:0003-6951

 

年代: 1998

 

DOI:10.1063/1.121528

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have verified that the condition of negative electron affinity (NEA) exists on hydrogen-terminated polycrystalline cubic boron nitride(c-BN)grown by the high-pressure high-temperature method using ultraviolet photoelectron spectroscopy. The NEA condition is thermally stable to 950 °C. At higher temperatures, the surface reverts to a positive electron affinity condition due to the desorption of surface bound hydrogen. Repeated annealing at high temperatures results in the degradation of the surface crystallinity, which manifests in the growth of a&pgr;→&pgr;*feature attributable tosp2-type bonds. Complete regeneration of initial valence band features and NEA conditions along with the suppression of the&pgr;→&pgr;*features can be achieved by subjecting the surface to atomic hydrogen etching. It is discovered that the He (II)-excited valence band spectra ofc-BNdisplay significant differences between the hydrogen-terminated and hydrogen-free surface. ©1998 American Institute of Physics.

 

点击下载:  PDF (177KB)



返 回