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Xenon fluoride laser excitation by transverse electric discharge

 

作者: R. Burnham,   N. W. Harris,   N. Djeu,  

 

期刊: Applied Physics Letters  (AIP Available online 1976)
卷期: Volume 28, issue 2  

页码: 86-87

 

ISSN:0003-6951

 

年代: 1976

 

DOI:10.1063/1.88649

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Stimulated emission has been produced in mixtures of He, NF3, and Xe at total pressures between 300 and 1000 Torr. Laser emission was on lines at 3511 and 3531 A˚ which have been associated with the excited XeF molecule. Excitation of the gas mixture was by a transverse electric discharge which produced pulses with peak currents of approximately 104A and rise times of 20 ns. A maximum laser energy of 7 mJ was obtained from a gas mixture with a ratio of He:Xe:NF3of 98.0:1.5:0.5 at a total pressure of 300 Torr.

 

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