Xenon fluoride laser excitation by transverse electric discharge
作者:
R. Burnham,
N. W. Harris,
N. Djeu,
期刊:
Applied Physics Letters
(AIP Available online 1976)
卷期:
Volume 28,
issue 2
页码: 86-87
ISSN:0003-6951
年代: 1976
DOI:10.1063/1.88649
出版商: AIP
数据来源: AIP
摘要:
Stimulated emission has been produced in mixtures of He, NF3, and Xe at total pressures between 300 and 1000 Torr. Laser emission was on lines at 3511 and 3531 A˚ which have been associated with the excited XeF molecule. Excitation of the gas mixture was by a transverse electric discharge which produced pulses with peak currents of approximately 104A and rise times of 20 ns. A maximum laser energy of 7 mJ was obtained from a gas mixture with a ratio of He:Xe:NF3of 98.0:1.5:0.5 at a total pressure of 300 Torr.
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