Mott transition field effect transistor
作者:
D. M. Newns,
J. A. Misewich,
C. C. Tsuei,
A Gupta,
B. A. Scott,
A. Schrott,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 73,
issue 6
页码: 780-782
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.121999
出版商: AIP
数据来源: AIP
摘要:
A field effect transistor fabricated with an oxide channel has been shown to demonstrate switching characteristics similar to conventional silicon metal oxide field effect transistors. This device is believed to operate via a Mott metal-insulator transition induced by the gate field, and offers a potential technology alternative for the regime beyond silicon scaling limitations. ©1998 American Institute of Physics.
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