Determination of the capture cross section and degeneracy factor of Si‐SiO2interface states
作者:
Wendell D. Eades,
Richard M. Swanson,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 44,
issue 10
页码: 988-990
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.94622
出版商: AIP
数据来源: AIP
摘要:
A modified form of deep level transient spectroscopy (DLTS) has been employed to perform energy‐resolved measurements of Si‐SiO2interface states. Decreasing the height of the trap filling pulse from the order of volts, as in the usual DLTS procedure, to tens of millivolts allows trap filling measurements to be made, rendering possible the use of Shockley–Read–Hall theory to show that the degeneracy factor of interface states is around unity. The energy dependence of the capture cross section in the upper band gap is also calculated from Shockley–Read–Hall theory and is contrasted for oxidation ambients with and without added HCl.
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