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Undercooling of bulk liquid silicon in an oxide flux

 

作者: Y. Shao,   F. Spaepen,  

 

期刊: Journal of Applied Physics  (AIP Available online 1996)
卷期: Volume 79, issue 6  

页码: 2981-2985

 

ISSN:0021-8979

 

年代: 1996

 

DOI:10.1063/1.361222

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Drops of molten silicon surrounded by a SiO2–BaO–CaO flux were undercooled at 350 K below their melting temperature. This undercooling is 75 K greater than the largest one reported so far for bulk silicon. To account for this result as well as the nucleation data from laser‐melted thin films, classical nucleation theory requires a crystal‐melt interfacial tension with a positive temperature coefficient. ©1996 American Institute of Physics.

 

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