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Reactive evaporation of titanium oxide films with controlled Ti/O ratio

 

作者: H. Nozoye,   N. Nishimiya,   H. Sato,  

 

期刊: Applied Physics Letters  （AIP Available online 1989）
卷期: Volume 54, issue 3  

页码: 231-232

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.101445

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Oxidation state selected titanium oxide thin films (TinO2n−1;n=1–∞) were deposited by a combination of a pulsed molecular beam source and an electron beam metal source. The oxidation state of titanium was controlled solely by the number of gas pulses and the temperature of a substrate. The conditions for depositing crystalline TinO2n−1thin films were determined.

 

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