Temperature‐dependent dry cleaning characteristics of GaAs (111)B surfaces with a hydrogen electron cyclotron resonance plasma
作者:
L. M. Weegels,
T. Saitoh,
H. Kanbe,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 21
页码: 2870-2872
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113457
出版商: AIP
数据来源: AIP
摘要:
The cleaning of the GaAs (111)B surface with a hydrogen electron cyclotron resonance discharge plasma is investigated at temperatures between 200 and 500 °C and compared with the GaAs (100) surface. It is found that during the exposure the GaAs (111)B is etched in a non‐Arrhenius way with a higher etch rate at low temperatures. For temperatures 300–500 °C, the surface is severely roughened after exposure, while the (100) surface remains smooth in all cases. The near‐surface crystalline quality of GaAs (111)B remains higher than that of (100).
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