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Monte Carlo studies of positron implantation in elemental metallic and multilayer systems

 

作者: V. J. Ghosh,   D. O. Welch,   K. G. Lynn,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1994)
卷期: Volume 303, issue 1  

页码: 37-47

 

ISSN:0094-243X

 

年代: 1994

 

DOI:10.1063/1.45518

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have used a Monte Carlo computer code developed at Brookhaven to study the implantation profiles of 1‐10 keV positrons incident on a wide range of semi‐infinite metals and multilayer systems. Our Monte Carlo program accounts for elastic scattering as well as inelastic scattering from core and valence electrons, and includes the excitation of plasmons. The implantation profiles of positrons in many metals as well as Pd/Al, and Al/Co/Si multilayers are presented. Scaling relations and closed‐form expressions representing the implantation profiles are also discussed.

 

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