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Measurement of HCl electron attachment in relation to XeCl laser kinetics

 

作者: D. Kligler,   Z. Rozenberg,   M. Rokni,  

 

期刊: Applied Physics Letters  (AIP Available online 1981)
卷期: Volume 39, issue 4  

页码: 319-321

 

ISSN:0003-6951

 

年代: 1981

 

DOI:10.1063/1.92706

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electron attachment rate constant of HCl is measured ine‐beam‐excited mixtures of N2/HCl and Ar/H2/HCl, by observing the electron current decay after termination of ane‐beam pulse. The possible enhancement of attachment due to vibrational excitation of HCl undere‐beam pumping is studied, by performing measurements withe‐beam currents differing by a factor of 30. The consequences of the results for XeCl laser kinetics are discussed.

 

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