Relaxed GexSi1−xfilms grown by rapid thermal processing chemical vapor deposition
作者:
K. H. Jung,
Y. M. Kim,
D. L. Kwong,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 18
页码: 1775-1777
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.103096
出版商: AIP
数据来源: AIP
摘要:
High quality, epitaxial, relaxed GexSi1−xlayers have been grown by rapid thermal processing chemical vapor deposition. Relaxation is believed to be due primarily to the high deposition temperature of 1000 °C and occurred through the formation of an asymmetric misfit dislocation network aligned along the 〈110〉 directions and confined to the interface. The only other defects observed were single threading dislocations at the ends of misfit dislocations.
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