Large positive magnetoresistance in Cr/Ag/Cr trilayers
作者:
G. Verbanck,
K. Temst,
K. Mae,
R. Schad,
M. J. Van Bael,
V. V. Moshchalkov,
Y. Bruynseraede,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 11
页码: 1477-1479
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.118567
出版商: AIP
数据来源: AIP
摘要:
Large positive magnetoresistance (LPMR) effects have been measured at temperaturesT<100K in epitaxial Cr/Ag/Cr trilayers grown by molecular beam epitaxy. Compared to single Ag films, the magnetoresistance at 4.2 K is enhanced by nearly two orders of magnitude reaching values up to 120&percent; in a field of 8 Tesla. This behavior is related to a drastic modification of the electron scattering at the Ag interfaces due to the presence of the buffer and cap Cr layers. The LPMR curves measured at different temperatures demonstrate a scaling behavior typical for electron transport in two-dimensional systems. The magnitude of the LPMR is a function of temperature and residual resistance ratio and is influenced by the direction of the applied magnetic field. ©1997 American Institute of Physics.
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