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Large positive magnetoresistance in Cr/Ag/Cr trilayers

 

作者: G. Verbanck,   K. Temst,   K. Mae,   R. Schad,   M. J. Van Bael,   V. V. Moshchalkov,   Y. Bruynseraede,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 11  

页码: 1477-1479

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.118567

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Large positive magnetoresistance (LPMR) effects have been measured at temperaturesT<100K in epitaxial Cr/Ag/Cr trilayers grown by molecular beam epitaxy. Compared to single Ag films, the magnetoresistance at 4.2 K is enhanced by nearly two orders of magnitude reaching values up to 120&percent; in a field of 8 Tesla. This behavior is related to a drastic modification of the electron scattering at the Ag interfaces due to the presence of the buffer and cap Cr layers. The LPMR curves measured at different temperatures demonstrate a scaling behavior typical for electron transport in two-dimensional systems. The magnitude of the LPMR is a function of temperature and residual resistance ratio and is influenced by the direction of the applied magnetic field. ©1997 American Institute of Physics.

 

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