首页   按字顺浏览 期刊浏览 卷期浏览 The role of interfacial energy in the development of preferred orientations of silver o...
The role of interfacial energy in the development of preferred orientations of silver on silicon

 

作者: J. Shirokoff,   U. Erb,  

 

期刊: Philosophical Magazine Letters  (Taylor Available online 1988)
卷期: Volume 58, issue 5  

页码: 255-260

 

ISSN:0950-0839

 

年代: 1988

 

DOI:10.1080/09500838808214761

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

The existence of cusps in the interfacial energy against misorientation curve has been studied for Ag/Si(l00) and Ag/Si(111) interfaces using the modified sphere-plate technique. The following preferred orientations were obtained: Ag(100)//Si(100) with Ag[011]//Si[011], and Ag(111)//Si(111) with Ag[110]//Si[114]. These are the same preferred orientation relationships previously found in studies of thin-film growth and appear to be due to low interfacial energies. In addition, preferred orientations Ag(100)//Si(100), Ag(111)//Si(100) and Ag(111)//Si(111) without any preferred directional alignment were observed. These latter orientations are believed to be the result of the native silicon oxide layer present between silver and the silicon single crystals.

 

点击下载:  PDF (339KB)



返 回