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Resistivity of Xenon Plasma

 

作者: John H. Goncz,  

 

期刊: Journal of Applied Physics  (AIP Available online 1965)
卷期: Volume 36, issue 3  

页码: 742-743

 

ISSN:0021-8979

 

年代: 1965

 

DOI:10.1063/1.1714211

 

出版商: AIP

 

数据来源: AIP

 

摘要:

By measuring voltage drop in xenon flashtubes the resistivity of intense xenon plasmas is found to bear an inverse square root relation to the current density. A weak dependence on pressure is discussed.

 

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