Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films
作者:
A. Hatta,
K. Kadota,
Y. Mori,
T. Ito,
T. Sasaki,
A. Hiraki,
S. Okada,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 13
页码: 1602-1604
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113865
出版商: AIP
数据来源: AIP
摘要:
Pulse operation of electron cyclotron resonance plasma was performed for the fabrication of diamond films by chemical vapor deposition. With square wave amplitude modulation of microwaves at 500 Hz in frequency, the growth rate became twice as large as one of continuous operation with the same microwave power. Time resolved measurement of the optical emission from the pulse modulated plasma was also carried out. ©1995 American Institute of Physics.
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