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Electronic characterization of indium tin oxide/silicon photodiodes

 

作者: N. S. Chang,   J. R. Sites,  

 

期刊: Journal of Applied Physics  (AIP Available online 1978)
卷期: Volume 49, issue 9  

页码: 4833-4837

 

ISSN:0021-8979

 

年代: 1978

 

DOI:10.1063/1.325513

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Photodiodes of indium tin oxide deposited on single‐crystalp‐silicon are analyzed with respect to their electronic properties. Dark measurements include the current and capacitance dependences on voltage and temperature. Photocurrent measurements reveal the relationship to the illumination intensity, temperature, and wavelength of light. Analysis reveals a relatively large, but temperature‐dependent, built‐in voltage and a small interface recombination probability.

 

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