High‐concentration Ce doping atn‐ andp‐type Al/GaAs Schottky barrier interfaces
作者:
E. B. Foxman,
N. Ikarashi,
K. Hirose,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 59,
issue 19
页码: 2403-2405
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.106029
出版商: AIP
数据来源: AIP
摘要:
Al/GaAs Schottky barriers are fabricated with 2.5–20‐A˚ thick doping layers of Ce of concentrations 1020cm−3and 1021cm−3situated below the GaAs surface. Schottky barrier heights (SBHs) are determined from current‐ and capacitance‐voltage measurements.n‐type SBHs decrease with increasing Ce doping layer thickness, whilep‐type SBHs increase, but to a lesser degree. A cross‐sectional image taken by high‐resolution transmission electron microscopy shows that Ce is located in the substitutional sites of the doping layers. The changes in the SBHs are attributed to strain induced by Ce atoms in the substitutional sites. The difference in the magnitudes of change observed forn‐ andp‐type SBHs is discussed in relation to the inhomogeneity observed in the density of Ce atoms at the interface regions.<pc;normal>
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