Pulsed laser annealing of GaAs and Si: Combined reflectivity and time‐of‐flight measurements
作者:
A. Pospieszczyk,
M. Abdel Harith,
B. Stritzker,
期刊:
Journal of Applied Physics
(AIP Available online 1983)
卷期:
Volume 54,
issue 6
页码: 3176-3182
ISSN:0021-8979
年代: 1983
DOI:10.1063/1.332476
出版商: AIP
数据来源: AIP
摘要:
Both GaAs and Si single crystals were laser annealed with a 20‐ns ruby laser pulse. By means of a time‐of‐flight measurement the velocity distribution and the density variation of evaporated Ga or As and Si atoms were determined for different energy densities. Simultaneously the reflectivity of the crystal surface was measured time‐resolved. The data show consistently that the molten phase occurs at energy densities ≳0.35 J cm−2for GaAs and ≳0.8 J cm−2for Si. The results are in agreement with a purely thermal model for laser annealing.
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