Plasma‐Enhanced Chemical Vapor Deposition of Boron Nitride Using Polymeric Cyanoborane as Source
作者:
Leon Maya,
期刊:
Journal of the American Ceramic Society
(WILEY Available online 1992)
卷期:
Volume 75,
issue 7
页码: 1985-1987
ISSN:0002-7820
年代: 1992
DOI:10.1111/j.1151-2916.1992.tb07229.x
出版商: Blackwell Publishing Ltd
数据来源: WILEY
摘要:
The plasma‐enhanced chemical vapor deposition (PECVD) of boron nitride films was studied using polymeric cyanoborane, (CNBH2)n, a material previously examined by thermally activated CVD. The PECVD procedure yields boron nitride coatings containing ≅20 wt% paracyanogen as a contaminant. This impurity can be removed by heat treatment under vacuum or in an ammonia atmosphere. The boron nitride coatings are hexagonal and appear to be boron deficient. The PECVD process takes place at 300°C, measured at the backside of the substrate, as compared with 600°C in the thermally activated CVD pr
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