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The growth of thin, heavily doped layers for hot electron devices

 

作者: J. J. Harris,   J. M. Woodcock,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1983)
卷期: Volume 1, issue 2  

页码: 196-198

 

ISSN:0734-211X

 

年代: 1983

 

DOI:10.1116/1.582486

 

出版商: American Vacuum Society

 

关键词: layers;tin additions;silicon additions;beryllium additions;gallium arsenides;schottky barrier diodes;crystal doping;molecular beam epitaxy

 

数据来源: AIP

 

摘要:

Thin layers of GaAs, heavily doped with Sn, Si, or Be, have been incorporated into Schottky barrier diode and bulk unipolar (camel) diode structures. The effective barrier height of the Schottky diodes has been varied between 0.48 and 0.96 eV by changing the doping and thickness of the heavily doped layer adjacent to the metal contact, and camel diodes with barriers between 0.55 and 0.94 eV have also been fabricated. There is a quantitative discrepancy between the experimental and theoretical diode parameters, however, and possible explanations are discussed.

 

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