Ramp‐type junction parameter control by Ga doping of PrBa2Cu3O7−&dgr;barriers
作者:
M. A. J. Verhoeven,
G. J. Gerritsma,
H. Rogalla,
A. A. Golubov,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 6
页码: 848-850
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117912
出版商: AIP
数据来源: AIP
摘要:
We analyzed the transport of charge carriers across PrBa2Cu3−xGaxO7−&dgr;(PBCGO) barriers as a function of barrier thickness, Ga‐doping level, temperature, and bias voltage. It was found that by Ga doping, the normal state resistance (Rn) of the junctions was systematically increased, while the critical current (Ic) remained constant. We argue that pair transport takes place by direct tunneling, whereas the quasiparticles have access to channels formed by one or more localized states inside the barrier. By Ga doping theIcRnproducts were increased, up to 8 mV at 4.2 K for junctions with 8 nm thick PrBa2Cu2.6Ga0.4O7−&dgr;barriers. ©1996 American Institute of Physics.
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