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Ramp‐type junction parameter control by Ga doping of PrBa2Cu3O7−&dgr;barriers

 

作者: M. A. J. Verhoeven,   G. J. Gerritsma,   H. Rogalla,   A. A. Golubov,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 69, issue 6  

页码: 848-850

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.117912

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We analyzed the transport of charge carriers across PrBa2Cu3−xGaxO7−&dgr;(PBCGO) barriers as a function of barrier thickness, Ga‐doping level, temperature, and bias voltage. It was found that by Ga doping, the normal state resistance (Rn) of the junctions was systematically increased, while the critical current (Ic) remained constant. We argue that pair transport takes place by direct tunneling, whereas the quasiparticles have access to channels formed by one or more localized states inside the barrier. By Ga doping theIcRnproducts were increased, up to 8 mV at 4.2 K for junctions with 8 nm thick PrBa2Cu2.6Ga0.4O7−&dgr;barriers. ©1996 American Institute of Physics.

 

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