首页   按字顺浏览 期刊浏览 卷期浏览 Hydrogen diffusion and acceptor passivation inp‐type GaAs
Hydrogen diffusion and acceptor passivation inp‐type GaAs

 

作者: R. Rahbi,   B. Pajot,   J. Chevallier,   A. Marbeuf,   R. C. Logan,   M. Gavand,  

 

期刊: Journal of Applied Physics  (AIP Available online 1993)
卷期: Volume 73, issue 4  

页码: 1723-1731

 

ISSN:0021-8979

 

年代: 1993

 

DOI:10.1063/1.353207

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Deuterium diffusion profiles in GaAs doped with different acceptors of group II (Mg,Zn,Cd) or group IV (C,Ge) have similar characteristics even though the neutralization of acceptors measured at 300 K is not always efficient. Conductivity and Hall measurements have been used to study the electrical characteristics of hydrogenatedp‐type GaAs epilayers. The temperature dependence of the free‐carrier concentration and hole mobility before and after hydrogenation shows that the neutralization of acceptors by atomic hydrogen leads to the elimination of the shallow acceptor states. Infrared‐absorption lines associated with hydrogen‐acceptor complexes are observed for all acceptors except magnesium. It is established that the microscopic structure of hydrogen‐acceptor complexes depends on the acceptor site in the lattice.

 

点击下载:  PDF (1061KB)



返 回