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Double Injection in Trap‐Free Silicon at Low Operating Points

 

作者: M. Hiramatsu,   S. Okazaki,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 13  

页码: 5312-5315

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1657388

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Double injection currents are measured over the temperature range from 340° to 200°K with plane parallel metal‐semiconductor‐metal structures. It is shown that, in the absence of traps, the injecting junction limits the current at low operating points. The current‐voltage characteristics are analyzed considering the property of the injection contact.

 

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