Very thin lead‐zirconate‐titanate films, 500 A˚ or less in thickness, have been prepared on Pt‐Ti metallized silicon wafers by a sol‐gel processing technique. Excellent ferroelectric, dielectric, and structural properties have been demonstrated. The maximum polarization and the remanent polarization at a switching voltage of 3 V on a film with a Zr/Ti ratio of about 50/50 are 33 and 12 &mgr;C/cm2, respectively. The capability of reaching a saturation polarization at a low voltage (∼3 V) on these films suggests that they are very attractive for use in radiation‐hard low‐voltage nonvolatile programmable random access memories.